The HiBi pulsed bias power supply is specially adapted for more demanding processes, such as HiPIMS and reactive HiPIMS processes, where conventional power supplies do not provide stable bias voltage. By using mid-frequency pulsing technology (100s of kHz) it is possible to also bias poorly conductive substrates, such as SiO2, or substrates covered with non-conductive coatings. Note that HiBi is not limited to HiPIMS deposition processes, but is equally effective in other PVD systems.
- Adapted to sustain a bias voltage even during HiPIMS discharges
- Mid-frequency pulsing ensures effective biasing even for non-conductive substrates
- Easy to install and replace any traditional substrate bias supply