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HOME >> HARDWARE >> HIPSTER 6 - POWER SUPPLY
 

Ionautics has developed a completely new ultra-fast HiPIMS power supply to meet the needs of future HiPIMS processes. It is a 6 kW HiPIMS unit suitable for R&D departments and academia.

Full range test

Tested for a full range of magnetrons and processes (incl. reactive HiPIMS) at the Royal Institute of Technology (KTH), Stockholm

Stable and robust

Stable and robust discharge process (constant voltage and no unwanted oscillations)

Externally triggered

Externally triggered and can also be controlled in master-slave configuration (multiple power supplies)

Need a DC driving unit?

The HiPSTER series offer an easy upgrade of an existing magnetron deposition system to true HiPIMS. If you already have a DC power supply capable of delivering ~1000 V and ~6 kW then all you need is the HiPSTER 6 unit.

If you also need a DC driving unit then please have a look at the HiPSTER DCPSU:s and contact us for a package deal.

Reactive HiPIMS process control option can be implemented upon request. This feature allows:

  • Stable operation in the transition mode
  • Wide process window of reactive gas flow with maintained stoichiometric composition

About HiPSTER 6

Qilin Fu
Research Director
Plasmatrix Materials AB
Sweden
 

 

Download Datasheet Download
HiPSTER Control Center Software
Reactive HiPIMS process control

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HiPIMS creates a new platform for us to study ‘internal friction’ damping phenomena in composite materials and the HiPSTER 6 offers a great possibility of extending the design of experiment matrices with higher energetic particle bombardment.

With the HiPIMS technology, we are able to use the competing growth mechanism of high energetic particles to generate globular nano-crystallized structures with nano-sized grains. That has enabled the tremendous damping mechanism inside the material for generating high dynamic stiffness materials (HiDaMat), which is a challenging research topic in material science.

The technology has made it possible for us to tailor our thin film properties for other engineering perspectives, while still being attractive for industrialization.