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HARD COATINGS

 

In HiPIMS the high degree of ionization of the deposition material leads to the growth of smooth and dense elemental as well as reactively deposited compound films. Several hard coatings processes are readily available, which are all based on many years of research in the group Plasma & Coatings Physics at Linköping University. Suitable coatings are: CrN, TiN, and Al2O3.

  • Reduced hysteresis in reactive-HiPIMS leads to a considerable increase in deposition rate
  • Good coverage even on rough substrate materials such as steel
  • Exceptionally dense coatings
  • Phase-tailoring (α-Al2O3 achieved at ~500 °C) leads to improved performance
   
  

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