Ionautics - HiPSTER 1 - POWER SUPPLY
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Ionautics has developed a new ultra-fast HiPIMS power supply to meet the needs of future HiPIMS processes. It is a 1 kW HiPIMS unit for R&D departments and academia and suitable for magnetron sizes up to 50 cm2 or approximately 3 inch circular targets.

Full range test

Tested for a full range of magnetrons and processes (incl. reactive HiPIMS) at the Royal Institute of Technology (KTH), Stockholm.

Stable and robust

Stable and robust discharge process (constant voltage and no unwanted oscillations)

Externally triggered

Externally triggered and can also be controlled in master-slave configuration (multiple power supplies).

Need a DC driving unit?

The HiPSTER series offer an easy upgrade of an existing magnetron deposition system to true HiPIMS. If you already have a DC power supply capable of delivering ~1000 V and ~1 kW then all you need is the HiPSTER 1 unit.

If you also need a DC driving unit then please contact us for a package deal.

Reactive process control

Reactive HiPIMS process control option can be implemented upon request. This feature allows:

  • Stable operation in the transition mode
  • Wide process window of reactive gas flow with maintained stoichiometric composition

About HiPSTER 1
Comments about
HiPSTER 1 by
Dr Oleksandr Polonskyi and
Dr Tetsuhide Shimizu


Download Datasheet Download HiPSTER Control
Center Software
Reactive HiPIMS process control



We successfully produce Ti and TiOx  nanoparticles using the HiPSTER 1 accompanied with a gas aggregation source based on 2-inch planar magnetron.

It was easy setting up the unit in our existing deposition equipment. Operation of the device is very simple using the computer interface and does not require special instructions, which is a big advantage for the University, where new students have to be involved into the experiment.

Due to our specific experimental conditions the discharge was usually running at higher pressure comparing with "normal sputtering". Here must be mentioned very high discharge stability at this pressure range (10-200 Pa) with argon used as a working gas as well as during reactive sputtering of Ti.




The first time when I used HiPSTER 1 was my half year stay in Linköping University. This experience totally dispelled my negative image for HiPIMS power supply that is believed as huge system in the big cabinet with hundreds of cables, and took me on a new aspect of how the lab-use HiPIMS power supply should be.

HiPSTER 1 is very compact and has great mobility owing to its simplicity in configuration and design. You can simply connect the cables to DC power supply and magnetron cathode and you can start to ignite plasma. In particular, if you have a few different vacuum chamber systems for different purpose as often seen in the laboratory usage, you can flexibly plan the experimental schedule from one system to another.

Moreover, a new function of reactive process control using “peak target current monitoring” proved its great potential in the field of reactive sputtering. As we have experienced with HfN and TiOx deposition, great stability in wide range of reactive gas flow was successfully demonstrated.

Since last autumn 2015, we have launched a new vacuum system installed with HiPSTER 1 unit in our university. We are very much looking forward to have promising results of high functional thin film coatings.