Full range test
Tested for a full range of magnetrons and processes (incl. reactive HiPIMS) at the Royal Institute of Technology (KTH), Stockholm.
Stable and robust
Stable and robust discharge process (constant voltage and no unwanted oscillations)
Externally triggered and can also be controlled in master-slave configuration (multiple power supplies).
Need a DC driving unit?
The HiPSTER series offer an easy upgrade of an existing magnetron deposition system to true HiPIMS. If you already have a DC power supply capable of delivering ~1000 V and ~1 kW then all you need is the HiPSTER 1 unit.
If you also need a DC driving unit then please contact us for a package deal.
Reactive process control
Reactive HiPIMS process control option can be implemented upon request. This feature allows:
- Stable operation in the transition mode
- Wide process window of reactive gas flow with maintained stoichiometric composition