HiPSTER Publications

• Low temperature growth of stress-free single phase α-W films using HiPIMS with synchronized pulsed substrate bias, Tetsuhide Shimizu, Kazuki Takahashi, Robert Boyd, Rommel Paulo Viloan, Julien Keraudy, Daniel Lundin, Ming Yang and Ulf Helmersson, J. Appl. Phys. 129, 155305 (2021)

• Tuning the stress in TiN films by regulating the doubly charged ion fraction in a reactive HiPIMS discharge, Rommel Paulo B. Viloan, Daniel Lundin, Julien Keraudy, and Ulf Helmersson, J. Appl. Phys. 127, 103302 (2020)

• Experimental verification of deposition rate increase, with maintained high ionized flux fraction, by shortening the HiPIMS pulse, T Shimizu, M Zanásˇka, R P Villoan, N Brenning, U Helmersson and Daniel Lundin, Plasma Sources Sci. Technol. 30 (2021) 045006 (8pp)

• Effect of temperature and deposition technology on the microstructure, chemistry and tribo-mechanical characteristics of Ti-B based thin films by magnetron sputtering, Silvia Maria Deambrosis , Valentina Zin , Francesco Montagner , Cecilia Mortal`o , Monica Fabrizio , Enrico Miorin, Surface & Coatings Technology 405 (2021) 126556

• Bipolar HiPIMS: The role of capacitive coupling in achieving ion bombardment during growth of dielectric thin films, Hao Du, Michal Zan´aˇska, Nils Brenning, Ulf Helmersson, Surface & Coatings Technology 416 (2021) 127152

• Pulse length selection for optimizing the accelerated ion flux fraction of a bipolar HiPIMS discharge, Rommel Paulo B. Viloan, Michal Zanásˇka, Daniel Lundin and Ulf Helmersson, Plasma Sources Sci. Technol. 29 (2021) 125013 (8pp)

• Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias, Rommel Paulo B. Viloan, Jiabin Gu, Robert Boyd, Julien Keraudy, Liuhe Li, Ulf Helmersson, Thin Solid Films 688 (2019) 137350

• Tuning high power impulse magnetron sputtering discharge and substrate bias conditions to reduce the intrinsic stress of TiN thin films, Felipe Cemin, Gregory Abadias, Tiberiu Minea, Daniel Lundin, Thin Solid Films 688 (2019) 137335

• Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering, Martin Rudolph, Nils Brenning, Michael A. Raadu, Hamidreza Hajihoseini, Jon Tomas Gudmundsson, André Anders and Daniel Lundin, Plasma Sources Sci. Technol. 29 (2020) 05LT01

• Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering, Hamidreza Hajihoseini, Martin Čada, Zdenek Hubička, Selen Ünaldi, Michael A. Raadu, Nils Brenning Jon Tomas Gudmundsson and Daniel Lundin, J. Vac. Sci. Technol. A 38, 033009 (2020).

• The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge, Hamidreza Hajihoseini, Martin Čada, Zdenek Hubička , Selen Ünaldi, Michael A. Raadu, Nils Brenning, Jon Tomas Gudmundsson and Daniel Lundin, Plasma 2019, 2(2), 201-221
• The adhesion and tribological properties of c-BN films deposited by high power impulse magnetron sputtering, İ. Efeoğlu, Y. Totık, A. Keleş, G. Gülten, K. Ersoy, G. Durkaya, Ceramics International 45, 3000 (2019).
• Microstructure-driven strengthening of TiB2 coatings deposited by pulsed magnetron sputtering, M.N.Polyakov, M.Morstein, X.Maeder, T.Nelis, D.Lundin, J.Wehrs, J.P.Best, T.E.J.Edwards, M.Döbeli, J.Michler, Surface and Coatings Technology 368, 88 (2019).
• Bipolar HiPIMS for tailoring ion energies in thin film deposition, Julien Keraudy, Rommel Paulo B.Viloan, Michael A.Raadu Nils Brenning Daniel Lundin Ulf Helmersson, Surface and Coatings Technology 359, 433 (2019).
• A thermal study of amorphous and textured carbon and carbon nitride thin films via transient grating spectroscopy, O. Cometto, C.A.Dennett, S.H. Tsang, M.P. Short, E.H.T.Teo, Carbon 130, 355 (2018).
• Catalytic Nanotruss Structures Realized by Magnetic Self-Assembly in Pulsed Plasma, S. Ekeroth, E.P. Munger, R. Boyd, J. Ekspong, T. Wågberg, L. Edman, N. Brenning, U. Helmersson, Nano Letters 18, 3132 (2018).
• dc magnetometry of niobium thin film superconductors deposited using high power impulse magnetron sputtering, S. Wilde, R. Valizadeh, O.B. Malyshev, G.B.G. Stenning, T. Sian, B. Chesca, Phys. Rev. Accel. Beams 21, 073101 (2018).
• Low-energy ion irradiation in HiPIMS to enable anatase TiO₂ selective growth, F. Cemin, M. Tsukamoto, J. Keraudy, V.G. Antunes, U. Helmersson, F. Alvarez, T. Minea, D. Lundin, J. Phys. D: Appl. Phys. 23, 235301 (2018).
• Low-Loss and Tunable Localized Mid-Infrared Plasmons in Nanocrystals of Highly Degenerate InN, S. Askari, D. Mariotti, J.E. Stehr, J. Benedikt, J. Keraudy, U. Helmersson, Nano Letters xx, xxxx (2018).
• Performance tuning of gas sensors based on epitaxial graphene on silicon carbide, M. Rodner, J. Bahonjic, M. Mathisen, R. Gunnarsson, S. Ekeroth, U. Helmersson, I.G. Ivanov, R. Yakimova, J. Eriksson, Materials & Design 153, 153 (2018).
• HiPIMS-deposited thermochromic VO2 films with high environmental stability, S. Loquai, B. Baloukas, J.E. Klemberg-Sapieha, L. Martinu, Solar Energy Materials and Solas Cells 160, 217 (2017).
• Properties of chromium thin films deposited in a hollow cathode magnetron powered by pulsed DC or HiPIMS, A. de Monteynard, F. Schuster, A. Billard, F. Sanchette, Surface and Coatings Technology 330, 241 (2017).
• Benefits of energetic ion bombardment for tailoring stress and microstructural evolution during growth of Cu thin films, F. Cemin, G. Abadias, T. Minea, C. Furgeaud, F. Brisset, D. Solas, and D. Lundin, Acta Mater. 141, 120 (2017).
• Plasma characterization in reactive sputtering processes of Ti in Ar/O2 mixtures operated in metal, transition and poisoned modes: a comparison between direct current and high-power impulse magnetron discharges, F. Haase, H. Kersten, D. Lundin, Eur. Phys. J. D 71, 245 (2017).
• Transition Mode Control in Reactive High-Power Impulse Magnetron Sputtering (R-HiPIMS), T. Shimizu, M. Villamayor, J. Keraudy, D. Lundin, U. Helmersson, J. Vac. Soc. Jpn. 60, 346 (2017).
• Suppressing tool chatter with novel multi-layered nanostructures of carbon based composite coatings, Q. Fu, G. S. Lorite, Md. Masud-Ur Rashid, T.Selkälä, J. Uusitalo, G. Toth, K. Kordas, T. Österlind, C. M. Nicolescu, J. Mater. Process. Tech. 223, 292 (2015). 

• Epitaxial growth of Cu(001) thin films onto Si(001) using a single-step HiPIMS process, F. Cemin, D. Lundin, C. Furgeaud, A. Michel, G. Amiard, T. Minea, and G. Abadias,  Scientific Reports 7, 1655 (2017).

• Low electrical resistivity in thin and ultrathin copper layers grown by high power impulse magnetron sputtering, Felipe Cemin, Daniel Lundin, Davide Cammilleri, Thomas Maroutian, Philippe Lecoeur and Tiberiu Minea; J. Va. Sci. Technol. A, 34, 051506 (2016) .

• Vertically self-ordered orientation of nanocrystalline hexagonal boron nitride thin films for enhanced thermal characteristics, Olivier Cometto; Bo Sun, Siu Hon Tsang, Xi Huang; Yee Kan Kohc, Edwin Hang Tong Teo, Nanoscale, 07 December 2015, Issue 45,  Page 18829 to 19326. 

• Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride, T. Shimizu, M. Villamayor, D. Lundin, U. Helmersson, Journal of Physics D: Applied Physics 49, 065202 (2016).

• Physical vapour deposition of thin films for use in superconducting RF cavities, S. Wilde, R. Valizadeh, O.B. Malyshev, G. B. G. Stenning, A. Hannah, D.O. Malyshev, S. Pattalwar, B. Chesca, Proceedings of the 6th International Particle accelerator Conference IPAC 2015, 3rd-8th May 2015, Richmond, Virginia, USA. JACoW, pp. 3249-3252.