HiPSTER 25
Our new HiPSTER 25 is equipped with cutting-edge transistors made from SiC (Silicon Carbide), unlocking advanced operational modes for superior performance and efficiency. The HiPSTER BiPolar HiPIMS Units represent the next generation of HiPIMS technology. Expertly designed by leaders in plasma process development and thin-film deposition, these units deliver robust and repeatable HiPIMS processes. With ultra-fast switching technology and enhanced HiPIMS pulse control, the HiPSTER BiPolar series is the ideal solution for developing and executing state-of-the-art HiPIMS applications.
FEATURES
- Bipolar operation provides ion acceleration without the need of substrate biasing
- Stable and robust process control using multiple process parameters
- Can be triggered externally (multiple power supplies)
- New switching technology allowing HiPIMS pulsing frequencies up to 150 kHz
- Tested using a wide range of magnetrons and processes (incl. reactive HiPIMS)
- Add Ionautics’ reactive process control for increased stability and higher deposition rate
APPLICATIONS
- Hard coatings: Smoother and denser elemental as well as reactively deposited compound coatings, which result in increased hardness, reduced corrosion, and less friction
- Optical coatings: Increased optical properties through smoother interfaces and denser structures
- Diffusion barriers: Better performance through increased coating density
- Electrical coatings: Improved conductivity enabling reduced coating thickness and reduced heat load. Also increased isolation in the case of insulators can be obtained
- 3-D coatings: Uniform film coverage on complex shaped substrates
Top-quality products require top-quality components. In order to achieve an optimal result, we recommend using our tailormade HiPSTER DC units and our cables. Contact us for a package deal.
Download data sheet here.
