Features
- Synchronized pulsing of up to eight units in the HiPSTER series
- Pulse trains with a fixed number of pulses at a fixed frequency
- Pulse trains synchronized between multiple units
- Synchronized and delayed pulses repeated at a common frequency
- Internal trigger available to synchronize other devices
- Can be triggered externally from another device acting as Master
- Multilayer deposition using more than one magnetron, where the user deposits a repeated sequence of layers with controlled layer thickness
- Co-sputtering of compounds from more than one magnetron
- Synchronized and delayed substrate bias for selective acceleration of ions, where different ionic species occur in the vicinity of the substrate at different points in time
- Synchronized HiPIMS process diagnostics by triggering external diagnostic equipment
