In Chronological Order
Publications
2012
Lundin and K. Sarakinos, An introduction to thin film processing using high power impulse magnetron sputtering, J. Mater. Res. 27, 780, (2012) Link: https://doi.org/10.1557/jmr.2012.8
2013
Size-controlled growth of nanoparticles in a highly ionized pulsed plasma.
Pilch, D. Söderström, N. Brenning, and U. Helmersson
Appl. Phys. Lett. 102, 033108 (2013) Link: http://dx.doi.org/10.1063/1.4788739
2015
Suppressing tool chatter with novel multi-layered nanostructures of carbon based composite coatings, Q. Fu, G. S. Lorite, Md. Masud-Ur Rashid, T.Selkälä, J. Uusitalo, G. Toth, K. Kordas, T. Österlind, C. M. Nicolescu, J. Mater. Process. Tech. 223, 292 (2015).
Physical vapour deposition of thin films for use in superconducting RF cavities, S. Wilde, R. Valizadeh, O.B. Malyshev, G. B. G. Stenning, A. Hannah, D.O. Malyshev, S. Pattalwar, B. Chesca, Proceedings of the 6th International Particle accelerator Conference IPAC 2015, 3rd-8th May 2015, Richmond, Virginia, USA. JACoW, pp. 3249-3252.
Vertically self-ordered orientation of nanocrystalline hexagonal boron nitride thin films for enhanced thermal characteristics, Olivier Cometto; Bo Sun, Siu Hon Tsang, Xi Huang; Yee Kan Kohc, Edwin Hang Tong Teo, Nanoscale, 07 December 2015, Issue 45, Page 18829 to 19326.
2016
Low electrical resistivity in thin and ultrathin copper layers grown by high power impulse magnetron sputtering, Felipe Cemin, Daniel Lundin, Davide Cammilleri, Thomas Maroutian, Philippe Lecoeur and Tiberiu Minea; J. Va. Sci. Technol. A, 34, 051506 (2016) .
Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride, T. Shimizu, M. Villamayor, D. Lundin, U. Helmersson, Journal of Physics D: Applied Physics 49, 065202 (2016).
2017
HiPIMS-deposited thermochromic VO2 films with high environmental stability, S. Loquai, B. Baloukas, J.E. Klemberg-Sapieha, L. Martinu, Solar Energy Materials and Solas Cells 160, 217 (2017).
Properties of chromium thin films deposited in a hollow cathode magnetron powered by pulsed DC or HiPIMS, A. de Monteynard, F. Schuster, A. Billard, F. Sanchette, Surface and Coatings Technology 330, 241 (2017).
Benefits of energetic ion bombardment for tailoring stress and microstructural evolution during growth of Cu thin films, F. Cemin, G. Abadias, T. Minea, C. Furgeaud, F. Brisset, D. Solas, and D. Lundin, Acta Mater. 141, 120 (2017).
Plasma characterization in reactive sputtering processes of Ti in Ar/O2 mixtures operated in metal, transition and poisoned modes: a comparison between direct current and high-power impulse magnetron discharges, F. Haase, H. Kersten, D. Lundin, Eur. Phys. J. D 71, 245 (2017).
Transition Mode Control in Reactive High-Power Impulse Magnetron Sputtering (R-HiPIMS), T. Shimizu, M. Villamayor, J. Keraudy, D. Lundin, U. Helmersson, J. Vac. Soc. Jpn. 60, 346 (2017).
Epitaxial growth of Cu(001) thin films onto Si(001) using a single-step HiPIMS process, F. Cemin, D. Lundin, C. Furgeaud, A. Michel, G. Amiard, T. Minea, and G. Abadias, Scientific Reports 7, 1655 (2017).
2018
A thermal study of amorphous and textured carbon and carbon nitride thin films via transient grating spectroscopy, O. Cometto, C.A.Dennett, S.H. Tsang, M.P. Short, E.H.T.Teo, Carbon 130, 355 (2018).
Catalytic Nanotruss Structures Realized by Magnetic Self-Assembly in Pulsed Plasma, S. Ekeroth, E.P. Munger, R. Boyd, J. Ekspong, T. Wågberg, L. Edman, N. Brenning, U. Helmersson, Nano Letters 18, 3132 (2018).
dc magnetometry of niobium thin film superconductors deposited using high power impulse magnetron sputtering, S. Wilde, R. Valizadeh, O.B. Malyshev, G.B.G. Stenning, T. Sian, B. Chesca, Phys. Rev. Accel. Beams 21, 073101 (2018).
Low-energy ion irradiation in HiPIMS to enable anatase TiO2 selective growth, F. Cemin, M. Tsukamoto, J. Keraudy, V.G. Antunes, U. Helmersson, F. Alvarez, T. Minea, D. Lundin, J. Phys. D: Appl. Phys. 23, 235301 (2018).
Low-Loss and Tunable Localized Mid-Infrared Plasmons in Nanocrystals of Highly Degenerate InN, S. Askari, D. Mariotti, J.E. Stehr, J. Benedikt, J. Keraudy, U. Helmersson, Nano Letters xx, xxxx (2018).
Performance tuning of gas sensors based on epitaxial graphene on silicon carbide, M. Rodner, J. Bahonjic, M. Mathisen, R. Gunnarsson, S. Ekeroth, U. Helmersson, I.G. Ivanov, R. Yakimova, J. Eriksson, Materials & Design 153, 153 (2018).
Catalytic Nanotruss Structures Realized by Magnetic Self-Assembly in Pulsed Plasma. Sebastian Ekeroth, E. Peter Münger, Robert Boyd, Joakim Ekspong, Thomas Wågberg, Ludvig Edman, Nils Brenning, and Ulf Helmersson, Nano Letters 18, 3132 (2018)
Link: http://dx.doi.org/10.1021/acs.nanolett.8b00718
2019
Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias, Rommel Paulo B. Viloan, Jiabin Gu, Robert Boyd, Julien Keraudy, Liuhe Li, Ulf Helmersson, Thin Solid Films 688 (2019) 137350
Tuning high power impulse magnetron sputtering discharge and substrate bias conditions to reduce the intrinsic stress of TiN thin films, Felipe Cemin, Gregory Abadias, Tiberiu Minea, Daniel Lundin, Thin Solid Films 688 (2019) 137335
The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge, Hamidreza Hajihoseini, Martin Čada, Zdenek Hubička , Selen Ünaldi, Michael A. Raadu, Nils Brenning, Jon Tomas Gudmundsson and Daniel Lundin, Plasma 2019, 2(2), 201-221
The adhesion and tribological properties of c-BN films deposited by high power impulse magnetron sputtering, İ. Efeoğlu, Y. Totık, A. Keleş, G. Gülten, K. Ersoy, G. Durkaya, Ceramics International 45, 3000 (2019).
Microstructure-driven strengthening of TiB2 coatings deposited by pulsed magnetron sputtering, M.N.Polyakov, M.Morstein, X.Maeder, T.Nelis, D.Lundin, J.Wehrs, J.P.Best, T.E.J.Edwards, M.Döbeli, J.Michler, Surface and Coatings Technology 368, 88 (2019).
Bipolar HiPIMS for tailoring ion energies in thin film deposition, Julien Keraudy, Rommel Paulo B.Viloan, Michael A.Raadu Nils Brenning Daniel Lundin Ulf Helmersson, Surface and Coatings Technology 359, 433 (2019).
2020
Lundin, T. Minea, and J. T. Gudmundsson, High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications, (Elsevier, Amsterdam, 2020).
Tuning the stress in TiN films by regulating the doubly charged ion fraction in a reactive HiPIMS discharge, Rommel Paulo B. Viloan, Daniel Lundin, Julien Keraudy, and Ulf Helmersson, J. Appl. Phys. 127, 103302 (2020)
H. Nadhom, D. Lundin, P. Rouf, and H. Pedersen, Chemical vapor deposition of metallic films using plasma electrons as reducing agents, J. Vac. Sci. Technol. A 38, 033402 (2020) Link: https://doi.org/10.1116/1.5142850
Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering, Martin Rudolph, Nils Brenning, Michael A. Raadu, Hamidreza Hajihoseini, Jon Tomas Gudmundsson, André Anders and Daniel Lundin, Plasma Sources Sci. Technol. 29 (2020) 05LT01
Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering, Hamidreza Hajihoseini, Martin Čada, Zdenek Hubička, Selen Ünaldi, Michael A. Raadu, Nils Brenning Jon Tomas Gudmundsson and Daniel Lundin, J. Vac. Sci. Technol. A 38, 033009 (2020).
2021
Low temperature growth of stress-free single phase α-W films using HiPIMS with synchronized pulsed substrate bias, Tetsuhide Shimizu, Kazuki Takahashi, Robert Boyd, Rommel Paulo Viloan, Julien Keraudy, Daniel Lundin, Ming Yang and Ulf Helmersson, J. Appl. Phys. 129, 155305 (2021)
Experimental verification of deposition rate increase, with maintained high ionized flux fraction, by shortening the HiPIMS pulse, T Shimizu, M Zanásˇka, R P Villoan, N Brenning, U Helmersson and Daniel Lundin, Plasma Sources Sci. Technol. 30 (2021) 045006 (8pp)
Effect of temperature and deposition technology on the microstructure, chemistry and tribo-mechanical characteristics of Ti-B based thin films by magnetron sputtering, Silvia Maria Deambrosis , Valentina Zin , Francesco Montagner , Cecilia Mortal`o , Monica Fabrizio , Enrico Miorin, Surface & Coatings Technology 405 (2021) 126556
Bipolar HiPIMS: The role of capacitive coupling in achieving ion bombardment during growth of dielectric thin films, Hao Du, Michal Zan´aˇska, Nils Brenning, Ulf Helmersson, Surface & Coatings Technology 416 (2021) 127152
Pulse length selection for optimizing the accelerated ion flux fraction of a bipolar HiPIMS discharge, Rommel Paulo B. Viloan, Michal Zanásˇka, Daniel Lundin and Ulf Helmersson, Plasma Sources Sci. Technol. 29 (2021) 125013 (8pp)
Magnetically Collected Platinum/Nickel Alloy Nanoparticles as Catalysts for Hydrogen Evolution,
Sebastian Ekeroth, Joakim Ekspong, Dimitrios K. Perivoliotis, Sachin Sharma, Robert Boyd, Nils Brenning, Eduardo Gracia-Espino, Ludvig Edman, Ulf Helmersson, and Thomas Wågberg
ACS Appl. Nano Mater., 4, 12957 (2021) Link: https://doi.org/10.1021/acsanm.1c01676
2022
Tailoring the structural and optical properties of HiPIMS TiO2 thin films for photovoltaic applications, N. Zinai, A. Bouzidi, N. Saoula, R. Miloua, M. Medles, W. Filali, E. Garoudjab, M. Azibi, P.R. Connelly, A. Nakrela, Optical Materials, Volume 131, September 2022, 112590
Tribological behavior of multiphase super hard boron nitride films deposited by HiPIMS, M. Flores-Jiménez, César Daniel Rivera Tello, J. Pérez-Alvarez, O. Jimenez, J. Chávez, D. Bravo-Barcenas , J. Muñoz-Saldaña, M. Flores-Martínez, Materials Letters 318 (2022) 132167
Microstructural and nanomechanical studies of PVD Cr coatings on SiC for LWR fuel cladding applications, Kyle Quillin, Hwasung Yeom, Tyler Dabney, Evan Willing, Kumar Sridharan, Surface & Coatings Technology 441 (2022) 128577