Excellence in thin films and coatings
With extensive expertise and high-quality products, we provide new solutions for advanced materials through the HiPIMS technology. Our products offer complete process control allowing reliable, robust, and high-quality thin films with accurate reproducibility. We are providing a complete environmentally friendly solution including both the hardware and the knowledge to fulfill your material process
A word from our CTO
“High-power impulse magnetron sputtering (HiPIMS) is thin film deposition from standard magnetrons using pulsed plasma discharges, where a large fraction of the
material used in the deposition process arrives at the workpiece as ions instead of commonly used neutrals.
The benefit of having an ionized deposition flux is that it can be guided and manipulated by electric and magnetic fields. This allows for increased control of the
properties of the coatings.”
Prof. Daniel Lundin
Chief Technology Officer and Member of the Board,
Associate Professor in Plasma and Coatings Physics
HiPIMS is a thin film deposition technique using pulsed plasma discharges from standard magnetrons, which ionizes the material flux. The benefit is that ions can be guided and manipulated by electric and magnetic fields leading to superior film performance
1. Customized Coatings
We work in close collaboration to meet your expectations and requirements. We have a proven track record of helping companies all around the globe to build new HiPIMS deposition systems and develop new coatings to handle critical challenges such as:
- Increase hardness
- Reduce friction
- Prevent material diffusion
- Cover complex structures
- Phase-tailor materials
- Increase wear resistance
2. DLC Coatings
3. ITO Coatings
We have developed a robust reactive HiPIMS process to grow ITO using an indium-tin target in an oxygen-argon atmosphere. We are unique in that we are offering a reactive HiPIMS process for ITO.
- Proven better coverage of complex-shaped surfaces: coat nano-structures
- Room temperature process
- Reactive process leads to higher deposition rate
- Decreased lateral resistivity by decreased intercolumnar porosity
- Decreased surface roughness
4. Barrier Coatings
Better performance through increased coating density thanks to two key features in HiPIMS:
- 1) a higher degree of ionization of the sputtered species compared to DC sputtering and
- 2) a higher intrinsic energy of the ionized material flux to the substrate even without a bias.
This opens up the possibility to create high-quality diffusion barriers for e.g. solar cells and fuel cells.
5. Hard Coatings
Smoother and denser elemental as well as reactively deposited compound coatings, which result in increased hardness, reduced corrosion, and less friction.
- Reduced hysteresis in reactive-HiPIMS leads to a considerable increase in deposition rate
- Good coverage even on rough substrate materials such as steel
- Exceptionally dense coatings
- Phase-tailoring leads to improved performance
6. Optical Coatings
Increased optical properties through smoother interfaces and denser structures.
7. Electrical Coatings
Improved conductivity enabling reduced coating thickness and reduced heat load. Increased isolation in the case of insulators can be obtained.
8. 3-D Coatings
Uniform film coverage on complex shaped substrates.
For an in-depth description of our HiPIMS Technology
We are proud to provide a selection of high-performance HiPIMS coatings. If you do not find what you are looking for then please contact us for customized projects.
In order to safeguard industrialization of the coating recipes we also provide the
necessary hardware and technical expertise. We also offer low-volume production, which eliminates the need for costly investments.
Want to know more about HiPIMS and ionized thin film deposition? Read our intro on the HiPIMS technology to learn more about our process.